JPS6339253Y2 - - Google Patents
Info
- Publication number
- JPS6339253Y2 JPS6339253Y2 JP15072980U JP15072980U JPS6339253Y2 JP S6339253 Y2 JPS6339253 Y2 JP S6339253Y2 JP 15072980 U JP15072980 U JP 15072980U JP 15072980 U JP15072980 U JP 15072980U JP S6339253 Y2 JPS6339253 Y2 JP S6339253Y2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- electric field
- etching
- cathode
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000005684 electric field Effects 0.000 claims description 25
- 238000005530 etching Methods 0.000 claims description 21
- 238000001312 dry etching Methods 0.000 description 5
- 238000010884 ion-beam technique Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 230000005672 electromagnetic field Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15072980U JPS6339253Y2 (en]) | 1980-10-22 | 1980-10-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15072980U JPS6339253Y2 (en]) | 1980-10-22 | 1980-10-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5774981U JPS5774981U (en]) | 1982-05-08 |
| JPS6339253Y2 true JPS6339253Y2 (en]) | 1988-10-14 |
Family
ID=29510080
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15072980U Expired JPS6339253Y2 (en]) | 1980-10-22 | 1980-10-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6339253Y2 (en]) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2717421B2 (ja) * | 1988-10-19 | 1998-02-18 | 日本真空技術株式会社 | 真空処理装置 |
-
1980
- 1980-10-22 JP JP15072980U patent/JPS6339253Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5774981U (en]) | 1982-05-08 |
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